| 摘要 |
A mother substrate for forming a plurality of substrate elements includes a first film formation region and a second film formation region. The first film formation region corresponds to a first substrate element and includes at least one first film formation section. The second film formation region corresponds to a second substrate element and includes at least one second film formation section, the second film formation section having a film formation surface area that is smaller than a film formation surface area of the first film formation section. The second film formation region is disposed in a position closer to a center of rotation of the mother substrate than the first film formation region when the mother substrate is placed on a rotation device of a film formation apparatus during arrangement of a film material on the mother substrate.
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