| 摘要 |
An exposure apparatus 1 that includes a projection optical system 30 and that exposes the substrate 41 and 42 via immersion liquid 35 supplied between the projection optical system 30 and the substrates 41 and 42, the exposure apparatus 1 comprising substrate stages 45 and 46 which is movable independently from each other, a transfer unit 47 provided on the substrate stage 45, a transfer unit 48 provided on the substrate stage 46, and a stage controller 60 configured to move the substrate stages 41 and 42 so that the transfer units 47 and 48 pass under the immersion liquid 35 in a state where the transfer units 47 and 48 are closely positioned, wherein at least a part of a side surface of the first transfer unit and at least a part of a side surface of the second transfer unit are constituted by a porous member.
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