Near Field Exposure That Reduces Scatter of a Surface Plasmon Polariton Wave Going Around a Light Blocking Member

摘要

An exposure mask in which exposure of an exposure object is carried out on the basis of near field light leaking from a plurality of openings provided in a light blocking member in a mutually adjoining relation, in which the spacing between adjacent openings is not greater than the wavelength of light used for the exposure, and an end portion of the opening at the exposure object side has a structure effective to reduce scatter of a surface plasmon polariton wave going around to the exposure object side of the light blocking member.