HIGH-FREQUENCY PLASMA PROCESSING APPARATUS AND METHOD

摘要

PROBLEM TO BE SOLVED: To provide a processing apparatus which surely conducts electric discharge for plasma with a simple structure even without preparing a new installation space.

SOLUTION: A high-frequency plasma processing method 10a includes generating the plasma between an external electrode 12 and an internal electrode (a source gas supply pipe) 13, and conducting predetermined processing in a plastic container. The processing apparatus has a member 20 for forming a facing portion free from the interposition of the plastic container provided in between the high frequency electrode 12 and the ground electrode 13.

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