发明名称 Edge Termination with Improved Breakdown Voltage
摘要 A MOSFET switch which has a low surface electric field at an edge termination area, and also has increased breakdown voltage. The MOSFET switch has a new edge termination structure employing an N-P-N sandwich structure. The MOSFET switch also has a polysilicon field plate configuration operative to enhance any spreading of any depletion layer located at an edge of a main PN junction of the N-P-N sandwich structure.
申请公布号 US2009206913(A1) 申请公布日期 2009.08.20
申请号 US20090367716 申请日期 2009.02.09
申请人 MAXPOWER SEMICONDUCTOR INC. 发明人 ZENG JUN;DARWISH MOHAMED N.;SU SHIH-TZUNG
分类号 H03K3/01;H01L29/06 主分类号 H03K3/01
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