MULTI-GRAY SCALE PHOTOMASK AND PATTERNING METHOD USING THE SAME

摘要

A multi gray scale photomask and a pattern transferring method using the same are provided to transfer the pattern of the multi gray scale photomask to an object layer by irradiating the exposure light. A shielding layer(22) is formed on a transparent substrate(21) and shields the exposure light. A transfer pattern with a light transmitting area, a shielding area, and a semi-transmitting area is formed by performing a pattern process in the semi-transmitting layer to partially transmit the exposure light. The semi-transmitting area includes a first semi-transmitting unit(24) about a specific pattern shape and a second semi-transmitting unit(25) about the pattern shape different from the specific pattern shape. The first semi-transmitting unit and the second semi-transmitting unit have nearly identical effective transmissivity about the exposure light.