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发明名称
METHOD FOR FABRICATING FINE PATTERN IN SEMICONDUCTOR DEVICE
摘要
申请公布号
KR100912959(B1)
申请公布日期
2009.08.20
申请号
KR20060110435
申请日期
2006.11.09
申请人
发明人
分类号
H01L21/336
主分类号
H01L21/336
代理机构
代理人
主权项
地址
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