| 发明名称 |
NOVEL COMPOUND AND METHOD OF PRODUCING THE SAME, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN |
| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a novel compound useful as an acid generator for a resist composition, a compound useful as a precursor of the compound and a method of producing the same, an acid generator, a resist composition, and a method of forming a resist pattern. <P>SOLUTION: The compound of a specific structure has a 7-oxabicyclo[2,2,1]heptanelactone group. <P>COPYRIGHT: (C)2009,JPO&INPIT |
| 申请公布号 |
JP2009186952(A) |
申请公布日期 |
2009.08.20 |
| 申请号 |
JP20080064131 |
申请日期 |
2008.03.13 |
| 申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
SESHIMO TAKEHIRO;IWAI TAKESHI;KAWAKAMI AKINARI;SHIMIZU HIROAKI;NAKAMURA TAKESHI;HANEDA HIDEO;HIDESAKA SHINICHI;KUROSAWA TSUYOSHI;MARUYAMA NATSUKO;MATSUZAWA KENSUKE |
| 分类号 |
G03F7/004;C07D493/10;G03F7/039 |
主分类号 |
G03F7/004 |
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