发明名称 PARTICLE INSPECTION APPARATUS, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
摘要 A particle inspection apparatus includes an irradiation unit configured to apply a light beam onto front and back surfaces of an object to be inspected, first and second detection units configured to detect scattering light from the surfaces, a calculation unit configured to conduct a particle inspection on the surfaces on the basis of outputs from the detection units, and a control unit configured to control the irradiation unit, the detection units, and the calculation unit. The irradiation unit can selectively apply the beam onto the front or back surface. The control unit causes the calculation unit to conduct the particle inspection on the inspection surface on which the light beam is selectively applied, on the basis of outputs made by the detection unit corresponding to simultaneous application and selective application of the light beam.
申请公布号 US2009207406(A1) 申请公布日期 2009.08.20
申请号 US20090389323 申请日期 2009.02.19
申请人 CANON KABUSHIKI KAISHA 发明人 KAWAHARA ATSUSHI
分类号 G01N21/88;G01N21/956;G03F1/84;G03F7/20;H01L21/027 主分类号 G01N21/88
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