发明名称 |
Coating a substrate with a conductive and transparent metallic oxide layer by sputtering in a continuous process, comprises moving and coating the substrate in a coating chamber at a coating source with a tubular target of metallic oxide |
摘要 |
#CMT# #/CMT# The method for coating a substrate with a conductive and transparent metallic oxide layer by sputtering in a continuous process, comprises moving and coating the substrate in a coating chamber at a coating source with a tubular target of the metallic oxide. The substrate has a temperature range from room temperature to 90[deg] C during the coating process, and the applied layer is subsequently heat treated. The thermal treatment is made via the separation of a further layer by the conductive layer after breaking of the vacuum in a separate process. #CMT# : #/CMT# The method for coating a substrate with a conductive and transparent metallic oxide layer by sputtering in a continuous process, comprises moving and coating the substrate in a coating chamber at a coating source with a tubular target of the metallic oxide. The substrate has a temperature range from room temperature to 90[deg] C during the coating process, and the applied layer is subsequently heat treated. The thermal treatment is made via the separation of a further layer by the conductive layer after breaking of the vacuum in a separate process. The thermal treatment of the metal oxide layer takes place at >= 350[deg] C. The substrate temperature is varied from ambient temperature to 90[deg] C by cleaning before the coating process. #CMT#USE : #/CMT# Method for coating a substrate with a conductive and transparent metallic oxide layer by sputtering in a continuous process, where the substrate is useful as e.g. transparent electrodes in thin film solar cells or in flat screens or components in optically selective layer systems. #CMT#ADVANTAGE : #/CMT# The method is capable of economically coating a substrate with improved and homogeneous optical and electrical characteristics of the layer such as transmission and specific surface resistance. |
申请公布号 |
DE102008009337(A1) |
申请公布日期 |
2009.08.20 |
申请号 |
DE20081009337 |
申请日期 |
2008.02.14 |
申请人 |
VON ARDENNE ANLAGENTECHNIK GMBH |
发明人 |
DIMER, MARTIN;KNOTH, THOMAS;LINS, VOLKER |
分类号 |
C23C14/34;C23C14/08 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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