发明名称 INTEGRAL SEMICONDUCTOR HEAT DISSIPATING SUBSTRATE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor heat dissipating substrate in which a low thermal expansion coefficient and a high thermal conductivity function with favorable balance by integrally molding an insulating board, a Si-Al composite material and a fin with diffused junction, and an adhesion degree between Si and Al can be enhanced by coating a surface of Si powder with Al powder, and the generation of distortion is suppressed by a notch, and a heat dissipating effect (cooling effect) is improved by a passage hole of the fin etc. SOLUTION: The semiconductor heat dissipating substrate is formed by integrally molding the insulating board of SiC, AlN etc., a composite material composed of the Si-Al composite material and the fin of an Al board with diffused junction. The Si of the Si-Al composite material is more than 50 vol% and less than 80 vol%. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009188366(A) 申请公布日期 2009.08.20
申请号 JP20080055526 申请日期 2008.02.05
申请人 AKANE:KK;HIROSHIMA PREF GOV 发明人 FUJII TOSHIO;FUYAMA NOBUYUKI;TERAYAMA AKIRA;SUNAMOTO KENICHI
分类号 H01L23/36;B22F3/14;B22F7/08;C22C21/02;H01L23/12 主分类号 H01L23/36
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