| 摘要 |
PROBLEM TO BE SOLVED: To draw a fine pattern over a wide drawing range at a high speed with high accuracy. SOLUTION: A dot is formed by exposing a region in a cell on a substrate by relatively stopping an incident position of an electron beam incident to a moving substrate by deflecting the electron beam. When a dot is not to be formed in the cell, the electron beam is deflected at a high speed so as to move the incident position of the electron beam at a high speed with respect to the substrate. Accordingly, as projection of the electron beam onto the cell can be turned on and off without blanking the electron beam, a pattern can be drawn on the substrate at a high speed. COPYRIGHT: (C)2009,JPO&INPIT
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