发明名称 VACUUM STAGE DEVICE AND ELECTRON BEAM IRRADIATION DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a vacuum stage device that can be inexpensively configured with high accuracy. SOLUTION: The vacuum stage device has a stage 11, an air spindle 4 rotating the stage 11, and a box 20 storing the air spindle 4, all in a vacuum chamber 1, and a sliding shaft 3 having a circular cross section and moving the stage 11 in one axial direction, which is disposed as extending from the inside of the vacuum chamber 1 to the outside, wherein the sliding shaft 3 extended from the box 20 to both sides to the outside of the vacuum chamber 1 along a straight line gives a unit structure, and only one unit structure is provided in the stage device. The stage device is provided with a rotation regulating mechanism 40 configured to regulate rotation of the sliding shaft 3 of the vacuum stage device and as well as to float by static pressure with respect to the floor. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009186594(A) 申请公布日期 2009.08.20
申请号 JP20080024215 申请日期 2008.02.04
申请人 SONY CORP 发明人 TAKASHIMIZU TORU;AKI YUICHI;MIURA YOSHIHISA
分类号 G03F7/20;G11B7/26;H01J37/20;H01L21/027 主分类号 G03F7/20
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