发明名称 SUBSTRATE TREATMENT DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a batch heat treatment device having a satisfactory energy efficiency. SOLUTION: The batch heat treatment device includes: a shield 52 for confining an electromagnetic wave to the outside of a process tube 36 concentrically arranged; an electromagnetic wave introduction port 53 drilled at central height of the shield 52; a waveguide 54 with its one end connected to the electromagnetic wave introduction port 53; and a microwave source 55 for supplying the microwave connected to the other end of the waveguide 54. A controller for regulating the frequency of the microwave is connected to the microwave source 55, and an electric field intensity measuring instrument is connected to the controller. A plurality of antennas 58 for detecting the electric field intensity are connected to the electric field intensity measuring instrument, and the plurality of antennas 58 are arranged to the shield 52 at intervals in the directions of height and circumference. An optimum frequency is acquired for each batch, and regulating the frequency of an output microwave from the microwave source for each batch prevents a fluctuation in treatment time between each other's batch to enhance the energy efficiency. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009188087(A) 申请公布日期 2009.08.20
申请号 JP20080024909 申请日期 2008.02.05
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 SHIRATORI WAKAKO
分类号 H01L21/22;C23C16/46;H01L21/268;H01L21/31;H01L21/324 主分类号 H01L21/22
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