| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a continuous polishing device capable of preventing clogging of a polishing pad and improving polishing efficiency. <P>SOLUTION: In the polishing device for continuously polishing a traveling substrate using a polishing head rotating around a rotary shaft, a supply hole for supplying polishing liquid is provided at a central part of the polishing head along the rotary shaft, the polishing pad, which does not have a through-hole and into which the polishing liquid penetrates, is closely adhered on the entire surface of the bottom part of the polishing head, and a pad side edge part is fixed to a peripheral part of the polishing head. The continuous polishing method using the continuous polishing device is also provided. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
