CLEANING COMPOSITION AND METHOD FOR CLEANING SUBSTRATE FOR ELECTRONIC DEVICE

摘要

Disclosed is a cleaning composition which is capable of removing both organic dirt and particle dirt adhering to a substrate for an electronic device with high cleaning degree, while being reduced in environmental burdens. A method for cleaning a substrate for electronic devices is also disclosed. The cleaning composition used for cleaning a substrate for electronic devices is characterized by containing a water-soluble salt (A) containing a transition metal, a chelating agent (B) and a peroxide (C). The cleaning composition is also characterized in that the chelating agent (B) is contained in an amount of not less than 0.5 molar equivalent to the water-soluble salt (A) containing a transition metal.