| 摘要 |
#CMT# #/CMT# The method involves producing a measuring intensity profile by a detector element (11) of a co-ordinate measuring machine (1) based on a group of repeating, periodic structures at a substrate (2) formed in a measuring window. A model function is adapted to the produced profile, and a function is determined based on design data for the structures at the substrate. An error relative to the position of the structures at the substrate is produced from a difference between the model function adapted to the produced profile and the function calculated from the design data. #CMT#USE : #/CMT# Method for determining a position of a periodic structure e.g. overlay mask, on a substrate during an overlay measurement and a double patterning process (all claimed). #CMT#ADVANTAGE : #/CMT# The error relative to the position of the periodic structures at the substrate is produced from the difference between the model function adapted to the produced measuring intensity profile and the function calculated from the design data, thus accurately determining the position of the periodic structure on the substrate. #CMT#DESCRIPTION OF DRAWINGS : #/CMT# The drawing shows a schematic view of a co-ordinate measuring machine that is used for determining a position of structures at a substrate. 1 : Co-ordinate measuring machine 2 : Substrate 9 : Measuring lens 10 : Camera 11 : Detector element. |
