| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for forming a micropattern which can easily form a pattern whose line width is narrower than that of an original for transfer. SOLUTION: One or more concave patterns are formed on a first substrate 3, and a dielectric film 4 is formed on the concave patterns. Thereafter, a first photo setting resin 2 is applied, and a second substrate 5 is bonded on the first photo setting resin 2. Then the first photo setting resin 2 is cured by irradiation with light. After curing, the first substrate 3 is separated from the second substrate 5 at a boundary between the dielectric film 4 and the first photo setting resin 2, and then a convex pattern whose line width is narrower than that of the concave pattern of the first substrate 3 is transferred to the first photo setting resin 2 on the second substrate 5. COPYRIGHT: (C)2009,JPO&INPIT
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