发明名称 FIELD-EFFECT TRANSISTOR AND METHOD FOR MANUFACTURING FIELD-EFFECT TRANSISTOR
摘要 <P>PROBLEM TO BE SOLVED: To provide a high-breakdown-voltage FET and a method for manufacturing the FET. <P>SOLUTION: FET which has MOS structure and is composed of a nitride-based compound semiconductor includes: a substrate; a semiconductor operation layer which is formed on the substrate and has a recess portion; an insulating film formed on the semiconductor operation layer having the recess portion; a gate electrode formed on the insulating film in the recess portion; and a source electrode and a drain electrode which are formed such that the recess portion is interposed between them and which are electrically connected to the semiconductor operation layer. The recess portion has side wall which extends while it tilting against the semiconductor operation layer. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009188397(A) 申请公布日期 2009.08.20
申请号 JP20090005154 申请日期 2009.01.13
申请人 FURUKAWA ELECTRIC CO LTD:THE 发明人 SATO YOSHIHIRO;KANBAYASHI HIROSHI;NIIYAMA YUUKI;NOMURA TAKEHIKO;YOSHIDA KIYOTERU;RI KO;IWAMI MASAYUKI
分类号 H01L29/78;H01L21/3065;H01L21/336;H01L21/338;H01L29/12;H01L29/778;H01L29/80;H01L29/812 主分类号 H01L29/78
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