Standoff/mask structure for electrical interconnect
摘要
The structure has an adhesive standoff layer attached to a liner layer. Standoff apertures (63) are formed in the liner layer and the adhesive standoff layer. A mask adhesive layer is attached to the liner layer. A mask liner layer (75) is attached to the mask adhesive layer. Mask apertures are formed in the mask adhesive layer and the mask liner layer in alignment with the standoff apertures. Independent claims are also included for the following: (a) a method of making a standoff/mask structure (b) a method of making an interconnected electrical circuit structure.
申请公布号
EP1482547(A3)
申请公布日期
2009.08.19
申请号
EP20040012627
申请日期
2004.05.27
申请人
XEROX CORPORATION
发明人
ANDREWS, JOHN, R.;GERNER, BRADLEY, J.;SCHMACHTENBERG, RICHARD, III;SLENES, CHAD;SCHULTZ, SAMUEL, V.