发明名称 |
Photovoltaics with interferometric masks |
摘要 |
<p>An interferometric mask covering the front electrodes of a photovoltaic device is disclosed. Such an interferometric mask may reduce reflections of incident light from the electrodes. In various embodiments, the mask reduces reflections so that a front electrode pattern appears similar in color to adjacent regions of visible photovoltaic active material.
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申请公布号 |
EP2058863(A3) |
申请公布日期 |
2009.08.19 |
申请号 |
EP20080153689 |
申请日期 |
2008.03.31 |
申请人 |
QUALCOMM MEMS TECHNOLOGIES, INC. |
发明人 |
KOTHARI, MANISH;KHAZENI, KASRA |
分类号 |
H01L31/0216;G02B5/28;G02B26/00 |
主分类号 |
H01L31/0216 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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