COMPOSITIONS INCORPORATION APPARATUS OF SUBSTRATE USING NEUTRAL BEAM AND METHOD THEREOF

摘要

A compositions incorporation apparatus of substrate using neutral beam and method thereof are provided to perform the implantation process of the neutralized ions and twice the formation process of the oxide film at least two times. The compositions incorporation apparatus(10) comprises the generating ion beam gas injector, the ion source portion(11), the grid assembly(14), the reflector and the stage. The gas injection hole for generating ion beam injects the gas in order to create the ion beam. The ion beam(11a) is produced from the beam gas injector having the ion source portion. The grid assembly is arranged in one side of the ion source portion. The reflector converts the ion beam into the neutral beam(11b). The stage has the substrate(16) on the route of the neutral beam. The formation process of the oxide film and implantation process of the neutralized ions are repetitively performed on the substrate.