发明名称 THIN FILM FOR REFLECTIVE FILM OR SEMI-REFLECTIVE FILM, SPUTTERING TARGET AND OPTICAL RECORDING MEDIUM
摘要 <p>A thin film for reflective film or semi-reflective film comprising a matrix of silver or silver alloy and, dispersed therein, a compound phase of at least one member selected from among aluminum, magnesium, tin, zinc, indium, titanium, zirconium, manganese and silicon nitrides, oxides, composite oxides, nitroxides, carbides, sulfides, chlorides, silicides (excluding silicon), fluorides, borides, hydrides, phosphides, selenides and tellurides. In this thin film, in addition to the above aluminum, etc., there may be dispersed at least one member selected from among silver, gallium, palladium and copper nitrides, oxides, composite oxides, nitroxides, carbides, sulfides, chlorides, silicides, fluorides, borides, hydrides, phosphides, selenides and tellurides. This thin film as deterioration of its reflectance is low even in long-term use can prolong the service life of various equipment having the thin film applied thereto, such as optical recording medium or display, and is also applicable to semi-reflective/semi-transmissive films for use in optical recording medium. ® KIPO & WIPO 2009</p>
申请公布号 KR20090087053(A) 申请公布日期 2009.08.14
申请号 KR20097011865 申请日期 2006.11.17
申请人 TANAKA KIKINZOKU KOGYO K.K. 发明人 OBATA TOMOKAZU;YANAGIHARA HIROSHI
分类号 G02B5/08;G11B7/258;G11B7/259 主分类号 G02B5/08
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