| 摘要 |
A transmitting optical element (33, 37) adapted for use in an objective for a microlithographic projection exposure apparatus is composed of a polycrystalline material (100), with the polycrystalline material (100) having crystallites (102) with a cubic crystal structure, and with the mean crystallite size of these crystallites (102) being at least (0.5) micrometers, and at most (100) micrometers.
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