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发明名称
Verfahren zum Plasmaätzen zur Erzeugung positiver Ätzprofile in Siliziumsubstraten
摘要
申请公布号
DE112007002680(A5)
申请公布日期
2009.08.13
申请号
DE200711002680T
申请日期
2007.08.15
申请人
TECHNISCHE UNIVERSITAET DRESDEN
发明人
RICHTER, KAROLA;ZSCHAETZSCH, GERD
分类号
H01L21/3065;B81C1/00
主分类号
H01L21/3065
代理机构
代理人
主权项
地址
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