发明名称 NON-VOLATILE MEMORY DEVICE AND METHOD OF MANUFACTURING THE SAME
摘要 <p><P>PROBLEM TO BE SOLVED: To solve the problem that in a phase change memory, electric property of a diode used as a selection element is extremely important, however since crystal grain boundaries are present in the film of a diode using polysilicon, variations in the off leak property becomes large making it difficult to prevent erroneous reading. <P>SOLUTION: There is provided a method of controlling the temperature profile of an amorphous silicon in the laser annealing for crystallizing and activating the amorphous silicon thereby controlling the crystal grain boundaries. Variation in the electric property of the diode can be decreased and the yield of the phase change memory can be improved. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009181971(A) 申请公布日期 2009.08.13
申请号 JP20080017013 申请日期 2008.01.29
申请人 HITACHI LTD 发明人 KINOSHITA KATSUJI;TERAO MOTOYASU;MATSUOKA HIDEYUKI;SASAKO YOSHITAKA;KIMURA YOSHINOBU;SHIMA AKIO;TAI MITSUHARU;TAKAURA NORIKATSU
分类号 H01L27/105;H01L45/00 主分类号 H01L27/105
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