| 摘要 |
PROBLEM TO BE SOLVED: To provide a film-forming apparatus and a film-forming method avoiding a displacement of a catalyst wire when electric current is supplied. SOLUTION: There are provided a film-forming stage holding a substrate S by setting up a film-forming face Sa of the substrate S, the catalyst wire 15 hung down so as to face the film-forming face Sa, and a power source for supplying electric current to the catalyst wire 15 for heating the catalyst wire 15, wherein a film-forming seed is generated by supplying a material gas to the heated catalyst wire 15, and a thin film is formed on the film-forming face Sa by depositing the film-forming seed on the film-forming face Sa. Also, there is provided a restriction wire 20 for imposing a restrictive magnetic field to the catalyst wire 15 by forming the restrictive magnetic field restricting the catalyst wire 15 along the film-forming Sa by acting on charged particles flowing in the catalyst wire 15. COPYRIGHT: (C)2009,JPO&INPIT
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