| 摘要 |
A liquid immersion exposure apparatus has a stage on which a substrate to be processed is disposed and that moves based on a position control signal, a projection unit that projects a beam onto the substrate to be processed, a liquid supply unit that supplies liquid between the substrate to be processed and the projection unit, a liquid discharge unit that discharges the liquid held between the substrate to be processed and the projection unit, a gas ejection unit includes a first ejection unit and a second ejection unit disposed so as to surround at least a part of the projection unit and each ejecting gas onto the substrate to be processed, and a control unit that controls an amount of gas flow at the first ejection unit and an amount of the gas flow at the second ejection unit based on a moving speed of the stage while the stage is being moved.
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