Method for Determining Exposure Settings, Lithographic Exposure Apparatus, Computer Program and Data Carrier

摘要

Embodiments of the invention relate to a method for determining exposure settings for a target field on a substrate in a lithographic exposure process, including providing calibration data by determining the position of a calibration field in a first direction at a plurality of calibration positions in a second and third direction relative to the position of the calibration field. The method also includes providing production data by establishing the position on the substrate of the target field in the second and third direction and by measuring the position of the exposure field in the first direction at at least one measurement position relative to the position of the exposure field in the second and third direction.