发明名称 A VERTICAL STRUCTURE SEMICONDUCTOR CHIP
摘要 <p>A vertical structure semiconductor chip comprises a metallization chip (300), a semiconductor epitaxy formed on the metallization chip (300), a passivation layer (307) covering the metallization chip (300) and the semiconductor epitaxy, and a patterned electrode (306). The metallization chip (300) comprises a first metal sheet (301), a second metal sheet (302), a first electrode (308), a second electrode (309) and conductive plugs (310,311). The first and second metal sheets (301,302) are electrically connected to the first and second electrodes (308,309) by the conductive plugs (310,311) respectively. The passivation layer (307) has windows(304,305) on the semiconductor epitaxy and the second metal sheet (302). The patterned electrode (306) is formed on the semiconductor epitaxy by the window (304), and extends to the window (305) of the second metal sheet (302).</p>
申请公布号 WO2009097786(A1) 申请公布日期 2009.08.13
申请号 WO2009CN70213 申请日期 2009.01.19
申请人 JIN, PENG;PENG, HUI 发明人 PENG, HUI
分类号 H01L33/38;H01L33/44;H01L33/48;H01L33/62 主分类号 H01L33/38
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