WIRING PATTERN, SUBSTRATE DEVICE, METHOD FOR FORMING SLIT IN WIRING PATTERN, METHOD FOR DESIGNING SLIT IN WIRING PATTERN, APPARATUS AND PROGRAM THEREFOR

摘要

PROBLEM TO BE SOLVED: To provide a wiring pattern in which a slit is formed with a larger opening area while suppressing increase in resistance. SOLUTION: Slits S that transmit UV rays to a photosetting sealing member constituting a sealing section are formed along electric lines of force 48 perpendicular to equipotential lines 47 of a wiring pattern body LP1 formed on a glass substrate of a liquid crystal cell. Thus, slits S having an increased opening area are formed while suppressing increase in resistance. COPYRIGHT: (C)2009,JPO&INPIT