发明名称 |
PATTERN EVALUATION METHOD, COMPUTER-READABLE RECORDING MEDIUM, AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE |
摘要 |
A pattern evaluation method includes: acquiring data of a design pattern for an evaluation pattern to detect a first edge of the design pattern; acquiring an image of the evaluation pattern to detect a second edge of the evaluation pattern; dividing the first edge into first linear parts and first corner parts; performing matching of the first and second edges to obtain correspondence between the first and second edges; dividing the second edge into second linear parts and second corner parts based on the correspondence between the first and second edges; and evaluating the evaluation pattern based on at least one of the second linear parts and the second corner parts.
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申请公布号 |
US2009202140(A1) |
申请公布日期 |
2009.08.13 |
申请号 |
US20090367273 |
申请日期 |
2009.02.06 |
申请人 |
MITSUI TADASHI |
发明人 |
MITSUI TADASHI |
分类号 |
G06K9/00;G06K9/48;G06K9/68 |
主分类号 |
G06K9/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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