发明名称 PHOTOVOLTAIC DEVICE COMPRISING A SPUTTER DEPOSITED PASSIVATION LAYER AS WELL AS A METHOD AND APPARATUS FOR PRODUCING SUCH A DEVICE
摘要 The present invention refers to a method of producing a photovoltaic device having at least one semiconductor unit comprising the following steps: a cleaning of at least one surface of the semiconductor unit by etching; drying of the at least one surface of the semiconductor unit in a substantially oxygen-free or oxygen-depleted environment; and depositing of a passivation layer on the at least one surface as well as to a device for carrying out such a method and to photovoltaic devices produced by this method.
申请公布号 US2009199901(A1) 申请公布日期 2009.08.13
申请号 US20080028457 申请日期 2008.02.08
申请人 APPLIED MATERIALS, INC. 发明人 TRASSL ROLAND;SCHRAMM SVEN;WOLKE WINFRIED;CATOIR JAN
分类号 H01L31/00;H01L21/3105 主分类号 H01L31/00
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