发明名称 |
PHOTOVOLTAIC DEVICE COMPRISING A SPUTTER DEPOSITED PASSIVATION LAYER AS WELL AS A METHOD AND APPARATUS FOR PRODUCING SUCH A DEVICE |
摘要 |
The present invention refers to a method of producing a photovoltaic device having at least one semiconductor unit comprising the following steps: a cleaning of at least one surface of the semiconductor unit by etching; drying of the at least one surface of the semiconductor unit in a substantially oxygen-free or oxygen-depleted environment; and depositing of a passivation layer on the at least one surface as well as to a device for carrying out such a method and to photovoltaic devices produced by this method.
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申请公布号 |
US2009199901(A1) |
申请公布日期 |
2009.08.13 |
申请号 |
US20080028457 |
申请日期 |
2008.02.08 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
TRASSL ROLAND;SCHRAMM SVEN;WOLKE WINFRIED;CATOIR JAN |
分类号 |
H01L31/00;H01L21/3105 |
主分类号 |
H01L31/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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