| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an evaluation method of a photomask, with which a photomask can be accurately evaluated. <P>SOLUTION: The method includes: a step S12 of measuring sizes of a plurality of pattern parts of a mask pattern formed on a photomask; a step S13 of determining an inter-pattern distance between a pattern part and other patterns different from the first pattern part, for each of the plurality of pattern parts; a step S14 of determining a size difference between the measured size of the pattern part and a target size of the pattern part, for each of the plurality of pattern parts; a step S15 of grouping the size difference determined in each pattern part into a plurality of groups in accordance with the inter-pattern distance determined in each pattern part; a step S16 of determining an evaluation value for each of the plurality of groups based on the size difference in each group; and a step S17 of evaluating the photomask on the basis of the evaluation values. <P>COPYRIGHT: (C)2009,JPO&INPIT |
