发明名称 |
Semi Conductor Process Residue Removal Composition and Process |
摘要 |
A composition that includes 2-(2-aminoethylamino)-ethanol, at least one of a chelating agent and a corrosion inhibitor, and water. The composition is capable of removing organic, organometallic and metal oxide residues from semiconductor substrates. The invention also relates to a method of removing etching residue from a semiconductor substrate.
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申请公布号 |
US2009203566(A1) |
申请公布日期 |
2009.08.13 |
申请号 |
US20090403600 |
申请日期 |
2009.03.13 |
申请人 |
LEE WAI MUN;SHANG CASS X;OTAKE ATSUSHI;KURODA AKIRA;MATSUMOTO TAKANORI;TAKEDA HISASHI |
发明人 |
LEE WAI MUN;SHANG CASS X.;OTAKE ATSUSHI;KURODA AKIRA;MATSUMOTO TAKANORI;TAKEDA HISASHI |
分类号 |
C11D1/68 |
主分类号 |
C11D1/68 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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