发明名称 |
Patch production |
摘要 |
A method of producing projections on a patch including providing a mask on a substrate and etching the substrate using an etchant and a passivant to thereby control the etching process and form the projections, wherein the passivant does not include oxygen. |
申请公布号 |
AU2009212106(A1) |
申请公布日期 |
2009.08.13 |
申请号 |
AU20090212106 |
申请日期 |
2009.02.05 |
申请人 |
THE UNIVERSITY OF QUEENSLAND |
发明人 |
MARK ANTHONY FERNANCE KENDALL;DEREK WILLIAM KENNETH JENKINS |
分类号 |
B81C1/00;A61B5/15;A61M5/32;A61M37/00;B81C99/00 |
主分类号 |
B81C1/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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