发明名称 METHOD FOR FORMING POLARIZATION REVERSAL STRUCTURE AND APPARATUS FOR FORMING POLARIZATION REVERSAL STRUCTURE
摘要 PROBLEM TO BE SOLVED: To form a polarization reversal structure having a uniform duty in a thickness direction of a wafer. SOLUTION: A method and an apparatus for forming a polarization reversal structure are disclosed, for forming a periodical polarization reversal structure in a wafer of a nonlinear optical crystal. The method and the apparatus for forming a polarization reversal structure includes a sequence of: a periodical pattern fabrication step of fabricating a periodical pattern from an insulating material, the pattern identical to the period of the polarization reversal structure, on one surface of a wafer of a nonlinear optical crystal subjected to a single domain process and to a mirror surface process; a counter face pattern fabricating step of fabricating a counter pattern from an insulating material opposing to the above periodical pattern, on the other surface of the wafer; and a polarization reversal structure forming step of applying a required DC voltage between both surfaces of the wafer so as to form a polarization reversal structure corresponding to the periodical pattern. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009180898(A) 申请公布日期 2009.08.13
申请号 JP20080019217 申请日期 2008.01.30
申请人 NTT ELECTORNICS CORP 发明人 KONDO NOBUYUKI;SATO HIDETAKA;NISHIDA YOSHIKI
分类号 G02F1/37 主分类号 G02F1/37
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