发明名称 NOVEL POSITIVE PHOTOSENSITIVE RESIN COMPOSITIONS
摘要 The present disclosure relates to compositions that include at least one polybenzoxazole precursor polymer, at least one photoacid generator, and at least one basic compound. Articles, films, and methods related to these compositions are also disclosed.
申请公布号 WO2009099954(A1) 申请公布日期 2009.08.13
申请号 WO2009US32675 申请日期 2009.01.30
申请人 FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.;NAIINI, AHMAD A.;RUSHKIN, ILYA;WEBER, WILLIAM;RACICOT, DONALD W. 发明人 NAIINI, AHMAD A.;RUSHKIN, ILYA;WEBER, WILLIAM;RACICOT, DONALD W.
分类号 G03F7/26;C07D209/48;G03C1/00 主分类号 G03F7/26
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