| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of improving surface treatment efficiency by preventing wasteful treatment liquid flow. SOLUTION: A plurality of substrates W are soaked in treatment liquid in a treatment tank while held by three substrate holding bars 33, 34 and 35 of a lifter 30 in the standing position. A first guide plate 40 and a second guide plate 50 are provided in front and rear of the plurality of arrayed substrates W. The first guide plate 40 and the second guide plate 50 are arranged, facing each other, at positions outside of both ends of arrays of a plurality of discharge holes provided to discharge nozzles 20 discharging the treatment liquid into the treatment tank. Thereby the first guide plate 40 and the second guide plate 50 prevent the treatment liquid from flowing toward the outside of the array of the substrates W, so that wasteful treatment liquid flow is prevented and surface treatment efficiency is improved. COPYRIGHT: (C)2009,JPO&INPIT
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