PATTERN FORMATION EMPLOYING SELF-ASSEMBLED MATERIAL

摘要

In one embodiment, hexagonal tiles encompassing a large are divided into three groups, each containing one-third of all hexagonal tiles that are disjoined among one another. Openings for the hexagonal tiles in each group (01, 02, 03) are formed in a template layer (2OA, 2OB, 20C), and a set of self-assembling block copolymers is applied and patterned within each opening. This process is repeated three times to encompass all three groups, resulting in a self-aligned pattern extending over a wide area. In another embodiment, the large area is divided into rectangular tiles of two non-overlapping and complementary groups. Each rectangular area has a width less than the range of order of self-assembling block copolymers. Self-assembled self- aligned line and space structures (4OA, 5OA; 4OB, 5OB; 4OC, 50C) are formed in each group in a sequential manner so that a line and space pattern is formed over a large area extending beyond the range of order.