A PROTECTIVE COATING FOR A PLASMA PROCESSING CHAMBER PART AND A METHOD OF USE
摘要
<p>A flexible polymer or elastomer coated RF return strap to be used in a plasma chamber to protect the RF strap from plasma generated radicals such as fluorine and oxygen radicals, and a method of processing a semiconductor substrate with reduced particle contamination in a plasma processing apparatus. The coated RF strap minimizes particle generation and exhibits lower erosion rates than an uncoated base component. Such a coated member having a flexible coating on a conductive flexible base component provides an RF ground return configured to allow movement of one or more electrodes in an adjustable gap capacitively coupled plasma reactor chamber.</p>
申请公布号
WO2009099661(A2)
申请公布日期
2009.08.13
申请号
WO2009US00786
申请日期
2009.02.06
申请人
LAM RESEARCH CORPORATION;KADKHODAYAN, BOBBY;MCCHESNEY, JON;PAPE, ERIC;DHINDSA, RAJINDER