发明名称 |
PATTERN MEASURING METHOD AND PATTERN MEASURING DEVICE |
摘要 |
A pattern measuring method and device are provided which set a reference position for a measuring point to be measured by a scanning electron microscope and the like, based on position information of a reference pattern on an image acquired from the scanning electron microscope and based on a positional relation, detected by using design data, between the measuring point and the reference pattern formed at a position isolated from the measuring point.
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申请公布号 |
US2009200465(A1) |
申请公布日期 |
2009.08.13 |
申请号 |
US20090423197 |
申请日期 |
2009.04.14 |
申请人 |
SUTANI TAKUMICHI;MATSUOKA RYOICHI;MOROKUMA HIDETOSHI;KOMURO HITOSHI;SUGIYAMA AKIYUKI |
发明人 |
SUTANI TAKUMICHI;MATSUOKA RYOICHI;MOROKUMA HIDETOSHI;KOMURO HITOSHI;SUGIYAMA AKIYUKI |
分类号 |
G21K7/00 |
主分类号 |
G21K7/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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