发明名称 TRANSISTOR-TYPE PRESSURE SENSOR AND METHOD FOR FABRICATING THE SAME
摘要 A transistor-type pressure sensor is provided, having an upper and a lower substrates, a source/drain formed on the lower substrate and separated from each other, a channel layer formed between and on the source/drain, a dielectric layer and a gate. The gate is substantially formed between the source and the drain. The surface of the gate, being in contact with the dielectric layer, has a stepped surface profile, so that the channel length/width ratio can be changed due to the pressure sensed by the pressure sensor.
申请公布号 US2009199648(A1) 申请公布日期 2009.08.13
申请号 US20080189205 申请日期 2008.08.11
申请人 INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 发明人 SUNG CHAO-FENG;CHU CHIH-WEI;LEE YUH-ZHENG;CHENG CHAO-KAI
分类号 G01L9/00;H01L21/00 主分类号 G01L9/00
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