发明名称 |
PROTECTIVE COATING FOR A PLASMA PROCESSING CHAMBER PART AND A METHOD OF USE |
摘要 |
A flexible polymer or elastomer coated RF return strap to be used in a plasma chamber to protect the RF strap from plasma generated radicals such as fluorine and oxygen radicals, and a method of processing a semiconductor substrate with reduced particle contamination in a plasma processing apparatus. The coated RF strap minimizes particle generation and exhibits lower erosion rates than an uncoated base component. Such a coated member having a flexible coating on a conductive flexible base component provides an RF ground return configured to allow movement of one or more electrodes in an adjustable gap capacitively coupled plasma reactor chamber. |
申请公布号 |
US2009200269(A1) |
申请公布日期 |
2009.08.13 |
申请号 |
US20090368093 |
申请日期 |
2009.02.09 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
KADKHODAYAN BOBBY;MCCHESNEY JON;PAPE ERIC;DHINDSA RAJINDER |
分类号 |
C23F1/00;C23C14/00;C23C14/34;C23C16/00;C23F1/08;H05H1/24 |
主分类号 |
C23F1/00 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|