发明名称 METHOD AND APPARATUS FOR DETERMINING DETECTION SENSITIVITY FOR PATTERN INSPECTION
摘要 PROBLEM TO BE SOLVED: To shorten the time required for the setting of detection sensitivity to be performed at the start of inspection in pattern inspection for comparing a reference image with inspection images acquired by imaging patterns which should be identical in the surfaces of samples in which repetitive patterns are formed, detecting their different parts with prescribed detection sensitivity, and detecting parts in which the different parts are present as defective repetitive patterns. SOLUTION: Parts in which different parts between inspection images and a reference image are present are detected as defect candidates with first prescribed temporary detection sensitivity (S13). Difference images between the inspection images and the reference image at the part of each defect candidate are each stored in a prescribed storage means (S14). Gray level values of the difference images are compared with second temporary detection sensitivity to acquire a set of defect candidates detected with the second temporary detection sensitivity from among each defect candidate detected in S13. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009180710(A) 申请公布日期 2009.08.13
申请号 JP20080022632 申请日期 2008.02.01
申请人 TOKYO SEIMITSU CO LTD 发明人 MASE YASUHIRO
分类号 G01N21/956;G01B11/24;G06T1/00;H01L21/66 主分类号 G01N21/956
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