发明名称 |
Detachable electrostatic chuck for supporting a substrate in a process chamber |
摘要 |
A substrate support has an electrostatic chuck comprising an electrostatic puck with a dielectric covering an electrode capable of being charged to energize a process gas. The chuck has a frontside surface to receive a substrate and a base plate having an annular flange. A spring loaded heat transfer plate contacts the base plate, and has a fluid channel comprising first and second spiral channels. A pedestal is below the heat transfer plate.
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申请公布号 |
US2009201622(A1) |
申请公布日期 |
2009.08.13 |
申请号 |
US20080315679 |
申请日期 |
2008.12.04 |
申请人 |
APPLIED MATERIALS, INC. |
发明人 |
BROWN KARL;SHERSTINSKY SEMYON;WANG WEI W.;TSAI CHENG-HSIUNG;MEHTA VINEET;LAU ALLEN;SANSONI STEVE |
分类号 |
H01L21/683;H01H1/00;H01L21/68 |
主分类号 |
H01L21/683 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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