发明名称 Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus
摘要 A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
申请公布号 US2009201485(A1) 申请公布日期 2009.08.13
申请号 US20080289919 申请日期 2008.11.06
申请人 ASML NETHERLANDS B.V. 发明人 VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS;STAVENGA MARCO KOERT;WONG PATRICK;VAN DEN BOGAARD FREDERIK JOHANNES;VRIES DIRK DE;BESSEMS DAVID;MYCKE JACQUES ROGER ALICE
分类号 G03B27/32;B05C5/00;B05C11/00;B05D1/36;G03F7/004 主分类号 G03B27/32
代理机构 代理人
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