发明名称 |
Method of preparing a substrate for lithography, a substrate, a device manufacturing method, a sealing coating applicator and a sealing coating measurement apparatus |
摘要 |
A substrate for use in a lithographic projection apparatus. The substrate includes a sealing coating that covers at least a part of a first interface between two layers on the substrate, or between a layer and the substrate, and does not extend to a central portion of the substrate.
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申请公布号 |
US2009201485(A1) |
申请公布日期 |
2009.08.13 |
申请号 |
US20080289919 |
申请日期 |
2008.11.06 |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
VAN DER HEIJDEN MARCUS THEODOOR WILHELMUS;STAVENGA MARCO KOERT;WONG PATRICK;VAN DEN BOGAARD FREDERIK JOHANNES;VRIES DIRK DE;BESSEMS DAVID;MYCKE JACQUES ROGER ALICE |
分类号 |
G03B27/32;B05C5/00;B05C11/00;B05D1/36;G03F7/004 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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