YTTERBIUM SPUTTERING TARGET AND METHOD FOR MANUFACTURING THE TARGET

摘要

Provided is a method for manufacturing an ytterbium sputtering target. In the method, an ytterbium target material having a surface Vickers hardness (Hv) of 15 or more but not more than 40 is previously manufactured, and final finish processing is performed by machining to the surface of the ytterbium target material having such surface hardness. Unevenness (tear) that exists on the target surface after the final finish processing of the target material is remarkably reduced and generation of particles while performing sputtering is suppressed.