发明名称 ORGANIC THIN-FILM TRANSISTOR USING GATE INSULATION LAYER CONTAINING METAL OXIDE NANOPARTICLES IN PHOTOCURABLE TRANSPARENT POLYMER BY SOL-GEL AND PHOTOCURING REACTION, AND MANUFACTURING METHOD FOR THEM
摘要 PROBLEM TO BE SOLVED: To provide an organic thin-film transistor by using a transparent inorganic/polymer composite layer facilitating the change of a dielectric constant as a gate insulation layer, by forming and binding metal oxide nanoparticles in a photocurable transparent polymer by sol-gel and photocuring reactions. SOLUTION: This organic thin-film transistor uses a photocurable transparent inorganic/polymer composite layer 30 which is a gate insulator, and containing metal oxide nanoparticles having a dielectric constant very high relative to that of an existing gate insulator, and being readily adjustable; being able to increase an on/off current ratio while lowering a drive voltage; allowing the thickness of the gate insulator to be increased, without lowering the electrical capacitance by the high dielectric constant; and exerts excelling characteristics as an organic thin-film transistor by minimizing the leakage current. Since the thin-film transistor maintains the characteristics of a photocurable transparent polymer 70, as it is, thereby allowing a photocurable and minute pattern to be formed, and exhibits high processability. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009182329(A) 申请公布日期 2009.08.13
申请号 JP20090015038 申请日期 2009.01.27
申请人 KOREA INST OF SCIENCE & TECHNOLOGY 发明人 KIM JAI KYEONG;KIM DONG YOUNG;CHOI JUNE WHAN;YOON HO GYU
分类号 H01L29/786;C01G1/00;C01G19/00;C01G19/02;C01G30/00;C01G39/00;H01L21/312;H01L21/336;H01L51/05;H01L51/30 主分类号 H01L29/786
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