发明名称 MICRO ELECTROMECHANICAL DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a micro electromechanical device which prevents a damage of a sealing layer and is excellent in reliability. SOLUTION: The micro electromechanical device is provided with: a MEMS element 3 formed on a semiconductor substrate 2; a cavity forming film 4 for covering the MEMS element 3 to provide a cavity 9 between the element 3 and itself and having a through-hole 10 formed on part of its upper surface; the sealing layer 5 for stopping up the through-hole 10 of the film 4 to seal the MEMS element 3 within the cavity 9; a protective layer 6 for covering the sealing layer 5 to provide a cavity 11 between the layer 5 and itself; and a connecting member 12 for connecting the protective layer 6 with the semiconductor substrate 2. The connecting member 12 is made of synthetic resin with the permeability larger than that of a composition material of the protective layer 6. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009178778(A) 申请公布日期 2009.08.13
申请号 JP20080017729 申请日期 2008.01.29
申请人 TOSHIBA CORP 发明人 SUGIZAKI YOSHIAKI
分类号 B81B3/00 主分类号 B81B3/00
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